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  • Photo-Cat Used in R&D at Clemson University for Department of Defense

Photo-Cat Used in R&D at Clemson University for Department of Defense

May 29th, 2018

PFAS & PFOS Background & Information

Per- and polyfluoroalkyl substances (PFAS) are a diverse group of chemical compounds resistant to heat, water, and oil. For decades, they have been used in hundreds of industrial applications and consumer products such as carpeting, apparels, upholstery, food paper wrappings, fire-fighting foams and metal plating.  According to Military Times, the Pentagon has found that “water at or around at least 126 military installations contains potentially harmful levels of perfluorinated compounds, which have been linked to cancers and developmental delays for fetuses and infants.”  Thus, the benefits of this timely research by Clemson University, supported by Purifics and others, will provide a solution to PFAS contamination.  PFAS chemical contaminants occur widely and are difficult to remove and/or destroy. 
Purifics’ patented photocatalytic oxidation process, known as Photo-Cat®, will be utilized heavily in the advanced photocatalyst research & development.  The Photo-Cat® process is a chemical free advanced oxidation process (AOP) that destroys both organic chemical contaminants and pathogens. Photo-Cat is a proven commercialized process for purifying ground and surface water with all its challenges of metals, TSS, and other organics and has been applied across Industrial, Military and Municipal applications for over 25 years. 
Purifics has accumulated a data base of over 20 different photocatalytic catalysts that have been applied to our standard Photo-Cat L test platform and sees a high potential for success with this new catalyst underdevelopment. Photo-Cat would also address the break down products. 
All we need is to verify the new catalyst and it can be commercially applied at scale. 

Purifics has collaborated successfully with other institutions.  Recent collaborations include research on phosphorus recovery in conjunction with the University of Waterloo/Wilfred Laurier, marker based Direct Integrity Testing (DIT) development (NEWT (Rice/Arizona State University)) and the development of 6th generation ceramic membrane technology (Cfd). 

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